PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
Seiten
1998
Academic Press Inc (Verlag)
978-0-12-533026-8 (ISBN)
Academic Press Inc (Verlag)
978-0-12-533026-8 (ISBN)
This series focuses on studies of the properties of various thin films materials and systems. Topics in this volume include: physics of sputtering; the planar magnetron; directional deposition; and process modelling for magnetron deposition.
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.
In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.
This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Ronald A. Powell. Palo Alto, California. Novellus Systems, Inc., Palo Alto California - Stephen M. Rossnagel. Yorktown Heights, New York. IBM Corporation, T.J. Watson Research Center, Yorktown Heights, New York
Useful Conversion Factors and Constants
Introduction
Physics of Sputtering
Plasma Systems
The Planar Magnetron
Sputtering Tools
Directional Deposition
Planarized PVD: Use of Elevated Temperature and/or High Pressure
Ionized Magnetron Sputter Deposition
PVD Materials and Processes
Process Modeling for Magnetron Deposition
Sputtering Targets
| Erscheint lt. Verlag | 29.10.1998 |
|---|---|
| Mitarbeit |
Herausgeber (Serie): Stephen M. Rossnagel, Ronald Powell, Abraham Ulman |
| Verlagsort | San Diego |
| Sprache | englisch |
| Maße | 152 x 229 mm |
| Gewicht | 810 g |
| Themenwelt | Naturwissenschaften ► Chemie ► Physikalische Chemie |
| Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik | |
| Technik ► Maschinenbau | |
| ISBN-10 | 0-12-533026-X / 012533026X |
| ISBN-13 | 978-0-12-533026-8 / 9780125330268 |
| Zustand | Neuware |
| Informationen gemäß Produktsicherheitsverordnung (GPSR) | |
| Haben Sie eine Frage zum Produkt? |
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