Particle Control for Semiconductor Manufacturing
Crc Press Inc (Verlag)
978-0-8247-8242-9 (ISBN)
R.P. Donovan
1: Particle Interaction with Integrated Circuits, 2: Introduction to Particle Science, 3: Particle Size Distributions, 4: Light Scattering Theory, 5: Developing Trust in Particle Counters, 6: Ultrafine (< 0.1 ?m Diameter) Particles, 7: Particle Control Methods: I, 8: Predicted and Measured Clean-Room Contamination, 9: The Dynamics of Aerosols in Clean-Room Environments: Implications for Monitoring and Control of Airborne Particles and Their Sources, 10: Measurement and Minimization of Particles in Process Gases, 11: Particles in Process Liquids, 12: The Immersion Wet Process System, 13: Measurement of Particles from Equipment and Processes: the Particles-per-Wafer-per-Pass (PWP) Method, 14: Measurement of Particle Emission Rates from Equipment, 15: Survey of Process-Induced Defects, 16: Particle Control Methods: II, 17: Clean Equipment Design Rules and the SMIF Isolation Concept, 18: Airflow Modeling and Particle Control by Vertical Laminar Flow, 19: Particle Deposition Data: Room Air Ionization as a Control Method, 20: Particle Identification, 21: Particle Adhesion to Surfaces: Theory of Cleaning, 22: Experimental Evaluation of Cleaning Techniques, 23: Wafer Cleaning: Present and Future, 24: Equipment Cleaning to Minimize Particle Deposition, 25: Review of FED-STD-209D, 26: Methods of Circuit Defectivity Analysis, lndex
| Erscheint lt. Verlag | 26.1.1990 |
|---|---|
| Verlagsort | Bosa Roca |
| Sprache | englisch |
| Maße | 178 x 254 mm |
| Gewicht | 1050 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 0-8247-8242-9 / 0824782429 |
| ISBN-13 | 978-0-8247-8242-9 / 9780824782429 |
| Zustand | Neuware |
| Informationen gemäß Produktsicherheitsverordnung (GPSR) | |
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