Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology

Saburo Nonogaki, Ueno Takumi, Toshio Ito (Autoren)

Buch | Hardcover

336 Seiten

1998
Crc Press Inc (Verlag)
978-0-8247-9951-9 (ISBN)

Infos

"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."

Autor

Saburo Nonogaki, Ueno Takumi, Toshio Ito

Inhalt

Exposure systems in photolithography; optical pattern transfer; chemistry of photoresist materials; practical processes in microlithography; X-ray lithography; electron-beam lithography; variations in microlithographic process.

Produkt-Details

• Erscheint lt. Verlag: 25.6.1998
• Verlagsort: Bosa Roca
• Sprache: englisch
• Maße: 152 x 229 mm
• Gewicht: 780 g
• Themenwelt: Technik ► Elektrotechnik / Energietechnik
• ISBN-10: 0-8247-9951-8 / 0824799518
• ISBN-13: 978-0-8247-9951-9 / 9780824799519
• Zustand: Neuware