Surface Passivation of Industrial Crystalline Silicon Solar Cells
Institution of Engineering and Technology (Verlag)
978-1-78561-246-6 (ISBN)
In the past few years, new tools have been developed to ensure low cost of ownership for high volume production of passivated silicon solar cells. Different deposition techniques (ALD, PECVD, APCVD) and different materials (SiO2, Al2O3, Si3N4) have been tested during the development process of more than 10 years. Now, the silicon solar cell manufacturing industry is picking up the concept of rear side passivation. The next generation silicon solar cells in production will be the PERC (Passivated Emitter and Rear Cell) type using all the reported achievements including novel tool concepts and process technologies.
This timely overview of silicon solar cell surface passivation, written by the leading experts in the field, is a key read for students and researchers working with silicon solar cells, as well as solar cell manufacturers.
Joachim John is Program Manager and Management Team member in the PV department of the Interuniversity Micro Electronic Centre (IMEC) in Leuven, Belgium. He received his Master degree from the Albert Ludwig University in Freiburg, Germany and his Ph.D. from the Swiss Federal Institute of Technology (ETH) in Zurich, Switzerland, both in physics. He is session chairman and committee member of the EU PVSEC, IEEE PVSC, Si-PV/n-PV and the SNEC, respectively. He serves as reviewer for several journals. He is expert team member of the PV Technology Platform of the European Commission. He has published more than 200 papers, given more than 40 invited presentations and holds 5 patents.
Chapter 1: Market position of PERC silicon solar cells
Chapter 2: Introduction to surface passivation of industrial crystalline silicon solar cells
Chapter 3: Material properties of AlOx for silicon surface passivation
Chapter 4: Material properties of Al2O3 grown on Si: interface trap density (Dit) and fixed charge density (Qf)
Chapter 5: PECVD-AlOx
Chapter 6: Atmospheric pressure chemical vapor deposition of aluminum oxide for silicon surface passivation - background and materials science
Chapter 7: Al2O3 by atmospheric pressure chemical vapour deposition
Chapter 8: Surface passivation of industrial PERC solar cells
Chapter 9: Al2O3 passivation in industrial solar cells: n-PERT
Chapter 10: Double-layer dielectric stacks for advanced surface passivation of crystalline silicon solar cells
Chapter 11: Hydrogenated amorphous silicon nitride (a-SiNx:H) as surface passivation layer
Chapter 12: Microwave PE CVD reactor and process for industrial high throughput fabrication of aluminum oxide layers for solar cell applications
Chapter 13: Spatial atomic layer deposition of A12O3: Levitrack, a one-pass ALD system with throughputs exceeding 6,000 wafers/h
Chapter 14: Spatial Al2O3 ALD: from Lab to Fab
| Erscheinungsdatum | 08.01.2019 |
|---|---|
| Reihe/Serie | Energy Engineering |
| Verlagsort | Stevenage |
| Sprache | englisch |
| Maße | 156 x 234 mm |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 1-78561-246-8 / 1785612468 |
| ISBN-13 | 978-1-78561-246-6 / 9781785612466 |
| Zustand | Neuware |
| Informationen gemäß Produktsicherheitsverordnung (GPSR) | |
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