1999 4th International Symposium on Plasma Process-Induced Damage
Seiten
1999
|
1999, 4th ed.
I.E.E.E.Press (Verlag)
978-0-9651577-3-5 (ISBN)
I.E.E.E.Press (Verlag)
978-0-9651577-3-5 (ISBN)
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This text constitutes the proceedings from the International Symposium on Plasma Process-Induced Damage, which took place in 1999. Topics covered include plasma equipment, electron shading, device characterization and backend process integration.
Plasma Equipment; Pattern Dependent Charging Effects; Electron Shading; Device Characterization; Charging Theory and Thin Gate Oxides; Equipment Enhancement; Thin Gate Oxide and Dielectrics; Frequency and Time Modulation Effects; Backend Process Integration; Charging Mechanisms and Measurements 001 0780351894
| Erscheint lt. Verlag | 30.9.1999 |
|---|---|
| Verlagsort | Piscataway NJ |
| Sprache | englisch |
| Maße | 216 x 279 mm |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik |
| Technik ► Elektrotechnik / Energietechnik | |
| ISBN-10 | 0-9651577-3-3 / 0965157733 |
| ISBN-13 | 978-0-9651577-3-5 / 9780965157735 |
| Zustand | Neuware |
| Informationen gemäß Produktsicherheitsverordnung (GPSR) | |
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