Ferroelectric Dielectrics Integrated on Silicon (eBook)

Emmanuel Defaÿ (Herausgeber)

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2013 | 1. Auflage
448 Seiten
John Wiley & Sons (Verlag)
978-1-118-60276-8 (ISBN)

Infos

This book describes up-to-date technology applied to high-K
materials for More Than Moore applications, i.e. microsystems
applied to microelectronics core technologies.

After detailing the basic thermodynamic theory applied to high-K
dielectrics thin films including extrinsic effects, this book
emphasizes the specificity of thin films. Deposition and patterning
technologies are then presented. A whole chapter is dedicated to
the major role played in the field by X-Ray Diffraction
characterization, and other characterization techniques are also
described such as Radio frequency characterization. An in-depth
study of the influence of leakage currents is performed together
with reliability discussion. Three applicative chapters cover
integrated capacitors, variables capacitors and ferroelectric
memories. The final chapter deals with a reasonably new research
field, multiferroic thin films.

Autor

Emmanuel Defaÿ has been involved at CEA LETI Minatec in piezoelectric and High-K dielectrics for 15 years. He has published 70 scientific papers, one book on piezoelectrics and worked with several top level microelectronics manufacturers (IBM, Freescale, ST). He is currently a lecturer at Ecole Centrale Paris and By-Fellow of Churchill College, Cambridge University, UK.

Produkt-Details

• Erscheint lt. Verlag: 7.2.2013
• Sprache: englisch
• Themenwelt: Technik ► Elektrotechnik / Energietechnik
• Schlagworte: Dielectrics & Electric Insulators • Dielektrika u. Isolatoren • Electrical & Electronics Engineering • Elektrotechnik u. Elektronik
• ISBN-10: 1-118-60276-5 / 1118602765
• ISBN-13: 978-1-118-60276-8 / 9781118602768