X–ray Photoelectron Spectroscopy – An introduction to Principles and Practices
John Wiley & Sons Inc (Hersteller)
9781118162897 (ISBN)
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Dr. van der Heide currently serves as the Group Lead of the Surface Analysis department at Samsung Austin, Texas which houses state-of-the-art XPS, AES, SIMS and AFM instrumentation. Former Assistant Professor, Chemistry Department, University of Houston, TX.
FOREWORD xi PREFACE xiii ACKNOWLEDGMENTS xv LIST OF CONSTANTS xvii 1 INTRODUCTION 1 1.1 Surface Analysis / 1 1.2 XPS/ESCA for Surface Analysis / 5 1.3 Historical Perspective / 6 1.4 Physical Basis of XPS / 7 1.5 Sensitivity and Specifi city of XPS / 10 1.6 Summary / 11 2 ATOMS, IONS, AND THEIR ELECTRONIC STRUCTURE 13 2.1 Atoms, Ions, and Matter / 13 2.1.1 Atomic Structure / 14 2.1.2 Electronic Structure / 15 2.1.2.1 Quantum Numbers / 16 2.1.2.2 Stationary-State Notation / 18 2.1.2.3 Stationary-State Transition Notation / 20 2.1.2.4 Stationary States / 21 2.1.2.5 Spin Orbit Splitting / 23 2.2 Summary / 25 3 XPS INSTRUMENTATION 27 3.1 Prerequisites of X-ray Photoelectron Spectroscopy (XPS) / 27 3.1.1 Vacuum / 28 3.1.1.1 Vacuum Systems / 32 3.1.2 X-ray Sources / 35 3.1.2.1 Standard Sources / 37 3.1.2.2 Monochromated Sources / 39 3.1.2.3 Gas Discharge Lamps / 41 3.1.2.4 Synchrotron Sources / 41 3.1.3 Electron Sources / 42 3.1.3.1 Thermionic Sources / 42 3.1.4 Ion Sources / 43 3.1.4.1 EI Sources / 43 3.1.5 Energy Analyzers / 44 3.1.5.1 CMA / 46 3.1.5.2 CHA / 46 3.1.5.3 Modes of Operation / 47 3.1.5.4 Energy Resolution / 48 3.1.6 Detectors / 49 3.1.6.1 EMs / 50 3.1.7 Imaging / 52 3.1.7.1 Serial Imaging / 52 3.1.7.2 Parallel Imaging / 54 3.1.7.3 Spatial Resolution / 56 3.2 Summary / 59 4 DATA COLLECTION AND QUANTIFICATION 61 4.1 Analysis Procedures / 61 4.1.1 Sample Handling / 62 4.1.2 Data Collection / 64 4.1.3 Energy Referencing / 65 4.1.4 Charge Compensation / 69 4.1.5 X-ray and Electron-Induced Damage / 71 4.2 Photoelectron Intensities / 72 4.2.1 Photoelectron Cross Sections / 74 4.2.2 The Analyzed Volume / 75 4.2.2.1 Electron Path Lengths / 76 4.2.2.2 Takeoff Angle / 79 4.2.3 The Background Signal / 80 4.2.4 Quantification / 81 4.3 Information as a Function of Depth / 83 4.3.1 Opening up the Third Dimension / 84 4.3.1.1 AR-XPS and Energy-Resolved XPS / 84 4.3.1.2 Sputter Depth Profi ling / 87 4.4 Summary / 97 5 SPECTRAL INTERPRETATION 101 5.1 Speciation / 101 5.1.1 Photoelectron Binding Energies / 102 5.1.1.1 The Z + 1 Approximation / 106 5.1.1.2 Initial State Effects / 107 5.1.1.3 Final State Effects / 118 5.1.1.4 The Auger Parameter / 133 5.1.1.5 Curve Fitting / 135 5.2 Summary / 138 6 SOME CASE STUDIES 141 6.1 Overview / 141 6.1.1 Iodine Impregnation of Single-Walled Carbon Nanotube (SWNT) / 142 6.1.2 Analysis of Group IIA-IV Metal Oxides / 145 6.1.3 Analysis of Mixed Metal Oxides of Interest as SOFC Cathodes / 151 6.1.4 Analysis of YBCO and Related Oxides/Carbonates / 156 6.2 Summary / 163 APPENDICES 167 APPENDIX A PERIODIC TABLE OF THE ELEMENTS 169 APPENDIX B BINDING ENERGIES ( B.E. XPS OR B.E. XRF) OF THE ELEMENTS 171 B.1 1s-3s, 2p-3p, and 3d Values / 171 B.2 4s-5s, 4p-5p, and 4d Values / 175 APPENDIX C SOME QUANTUM MECHANICS CALCULATIONS OF INTEREST 177 APPENDIX D SOME STATISTICAL DISTRIBUTIONS OF INTEREST 181 D.1 Gaussian Distribution / 182 D.2 Poisson Distribution / 182 D.3 Lorentzian Distributions / 183 APPENDIX E SOME OPTICAL PROPERTIES OF INTEREST 185 E.1 Chromatic Aberrations / 186 E.2 Spherical Aberrations / 186 E.3 Diffraction Limit / 186 APPENDIX F SOME OTHER SPECTROSCOPIC/SPECTROMETRIC TECHNIQUES OF INTEREST 189 F.1 Photon Spectroscopies / 191 F.1.1 IR, RAIRS, ATR, and DRIFTS / 191 F.1.2 Raman, SERS, and TERS / 192 F.1.3 EDX and WDX / 193 F.1.4 XRF and TXRF / 194 F.2 Electron Spectroscopies / 195 F.2.1 UPS / 195 F.2.2 AES / 195 F.2.3 EELS, REELS, and HREELS / 196 F.3 Ion Spectroscopies/Spectrometries / 196 F.3.1 SIMS / 196 F.3.2 TAP / 197 F.3.3 Ion Scattering Methods / 197 APPENDIX G SOME MICROSCOPIES OF INTEREST 199 G.1 SEM / 200 G.2 HIM / 201 G.3 TEM / 201 G.4 SPM (AFM and STM)-Based Techniques / 202 APPENDIX H SOME REFLECTION/DIFFRACTION TECHNIQUES OF INTEREST 205 H.1 XRD / 206 H.2 GID / 206 H.3 XRR / 207 H.4 LEED / 207 H.5 RHEED / 207 TECHNIQUE ABBREVIATIONS LIST 209 INSTRUMENT-BASED ABBREVIATIONS 213 GLOSSARY OF TERMS 215 QUESTIONS AND ANSWERS 221 XPS VENDORS 229 REFERENCES 233 INDEX 237
| Erscheint lt. Verlag | 9.11.2011 |
|---|---|
| Verlagsort | New York |
| Sprache | englisch |
| Maße | 150 x 250 mm |
| Gewicht | 666 g |
| Themenwelt | Naturwissenschaften ► Chemie ► Analytische Chemie |
| Technik ► Maschinenbau | |
| ISBN-13 | 9781118162897 / 9781118162897 |
| Zustand | Neuware |
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