Magneto-Lithography

Foundations and Applications

Ron Naaman, Amos Bardea (Autoren)

Buch | Hardcover

320 Seiten

2026
Wiley-VCH Verlag GmbH
978-3-527-41007-1 (ISBN)

Infos

Meeting the need for a book that conveys the knowledge in a coherent fashion, this work introduces the principles and applications of magnetolithography and discusses it within the context of more established methods. As such, it includes chemical patterning and metal deposition, also on non-planar surfaces, while covering many applications, such as microelectronics and lab-on-a-chip.
The result is a balanced discussion of all the available methods together with their advantages and shortcomings for surface physicists, materials scientists, electrical engineers, and those working in the semiconductor industry.

Autor

Ron Naaman Professor for Chemical Physics at the Weizmann Institute, Israel. He obtained his PhD at the Weizmann Institute and did postdoctoral work at Stanford for two years and then at Harvard for one year. He was a visiting Fellow at JILA and a visiting Professor at Pittsburgh University. He is a Fellow of the American Physical Society and a member of the advisory board of the Journal of Physical Chemistry. He has authored over 200 scientific publications.

Inhalt

The concepts of Magnetolihography
Chemical and biochemical patterning
Metal deposition and etching
Patterning magnetic surfaces
Lab on Chip (LOC) and microfluidity

Produkt-Details

• Erscheint lt. Verlag: 16.1.2026
• Verlagsort: Weinheim
• Sprache: englisch
• Maße: 170 x 240 mm
• Themenwelt: Technik ► Maschinenbau
• ISBN-10: 3-527-41007-4 / 3527410074
• ISBN-13: 978-3-527-41007-1 / 9783527410071
• Zustand: Neuware