Plasma Sources for Thin Film Deposition and Etching

Buch | Hardcover

328 Seiten

1994
Academic Press Inc (Verlag)
978-0-12-533018-3 (ISBN)

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Includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalanced magnetron sputtering, and particle formation in thin film processing plasma.

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Design of High- Density Plasma Sources for Materials Processing
M.A. Lieberman and R.A. Gottscho
Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films
O.A. Popov
Unbalanced Magnetron Sputtering
S.L. Rohde
The Formation of Particles in Thin-Film Processing Plasmas
Steinbruchel

Erscheint lt. Verlag	29.9.1994
Reihe/Serie	Physics of Thin Films
Mitarbeit	Herausgeber (Serie): John L. Vossen
Verlagsort	San Diego
Sprache	englisch
Maße	152 x 229 mm
Gewicht	720 g
Themenwelt	Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik
	Naturwissenschaften ► Physik / Astronomie ► Hochenergiephysik / Teilchenphysik
	Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik
ISBN-10	0-12-533018-9 / 0125330189
ISBN-13	978-0-12-533018-3 / 9780125330183
Zustand	Neuware