Thin Films by Chemical Vapour Deposition (eBook)

C.E. Morosanu (Autor)

G. Siddall (Herausgeber)

eBook Download: PDF

2016 | 1. Auflage
720 Seiten
Elsevier Science (Verlag)
978-1-4832-9173-4 (ISBN)

Infos

The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Inhalt

Front Cover 1
Thin Films by Chemical Vapour Deposition 4
Copyright Page 720
Table of Contents 10
Preface 6
Acknowledgements 8
Part I: INTRODUCTION 18
CHAPTER 1. EVOLUTION OF CVD FILMS 20
1.1 Introductory Remarks 20
1.2 Short History of CVD Thin Films 22
Part II: FUNDAMENTALS 30
CHAPTER 2. TECHNIQUES OF PREPARING THIN FILMS 32
2.1 Introduction 32
2.2 Electrolytic Deposition Techniques 33
2.3 Vacuum Deposition Techniques 34
2.4 Plasma Deposition Techniques 38
2.5 Liquid-Phase Deposition Techniques 39
2.6 Solid-Phase Deposition Techniques 40
2.7 Chemical Vapour Conversion of Substrate 40
2.8 Chemical Vapour Deposition 43
2.9 Comparison between CVD and Other Thin Film Deposition Techniques 55
CHAPTER 3. CHEMICAL PROCESSES USED IN CVD 61
3.1 Introduction 61
3.2 Description of Chemical Reactions Used in CVD 62
CHAPTER 4. THERMODYNAMICS OF CVD 92
4.1 General Remarks 92
4.2 Feasibility of a CVD Process 93
4.3 Techniques for Equilibrium Calculations in CVD Systems 96
4.4 Examples of Thermodynamic Studies of CVD Systems 100
CHAPTER 5. KINETICS OF CVD 102
5.1 Introduction 102
5.2 Steps and Control Type of a CVD Heterogeneous Reaction 102
5.3 Influence of Experimental Parameters on Thin Film Deposition Rate 103
5.4 Continuous Measurement of the Deposition Rate 109
5.5 Experimental Methods for Studying CVD Kinetics 110
5.6 Role of Homogeneous Reactions in CVD 116
5.7 Mechanism of CVD Processes 117
5.8 Kinetics and Mechanism of Dopant Incorporation 135
5.9 Transport Phenomena in CVD 136
5.10 Status of Kinetic and Mechanism Investigations in CVD Systems 137
CHAPTER 6. MEASUREMENT OF THIN FILM THICKNESS 142
6.1 Introduction 142
6.2 Mechanical Methods 143
6.3 Mechanical-Optical Methods 148
6.4 Optical Methods 150
6.5 Electrical Methods 162
6.6 Miscellaneous Methods 162
CHAPTER 7. NUCLEATION AND GROWTH OF CVD FILMS 164
7.1 Introduction 164
7.2 Stages in the Nucleation and Growth Mechanism 164
7.3 Regimes of Nucleation and Growth 165
7.4 Nucleation Theory 167
7.5 Dependence of Nucleation on Deposition Parameters 171
7.6 Heterogeneous Nucleation and CVD Film Structural Forms 174
7.7 Homogeneous Nucleation 174
7.8 Experimental Techniques 175
7.9 Experimental Results of CVD Film Nucleation 177
CHAPTER 8. THIN FILM STRUCTURE 178
8.1 Introduction 178
8.2 Techniques for Studying Thin Film Structure 179
8.3 Structural Defects in CVD Thin Films 197
CHAPTER 9. ANALYSIS OF CVD FILMS 202
9.1 Introduction 202
9.2 Analysis Techniques of Thin Film Bulk 202
9.3 Analysis Techniques of Thin Film Surfaces 211
9.4. Film Composition Measurement 222
9.5 Depth Concentration Profiling 223
CHAPTER 10. PROPERTIES OF CVD FILMS 224
10.1 Introduction 224
10.2 Mechanical Properties 225
10.3. Thermal Properties 229
10.4 Optical Properties 234
10.5. Photoelectric Properties 237
10.6 Electrical Properties 241
10.7 Magnetic Properties 265
10.8 Chemical Properties 269
Part III: TECHNIQUES 344
CHAPTER 11. EQUIPMENT AND SUBSTRATES 346
11.1 Introduction 346
11.2 Equipment for CVD 346
11.3 Safety in CVD 359
11.4 Substrates 361
CHAPTER 12 PREPARATION AND PROPERTIES OF SEMICONDUCTING THIN FILMS 374
12.1 Introduction 374
12.2 Homoepitaxial Semiconducting Films 374
12.3 Heteroepitaxial Semiconducting Films 403
12.4 Polycrystalline Semiconducting Thin Films 414
12.5 Amorphous Semiconducting Thin Films 419
CHAPTER 13. PREPARATION AND PROPERTIES OF AMORPHOUS INSULATING THIN FILMS 423
13.1 Introduction 423
13.2 Oxides 426
13.3. Nitrides and Oxynitrides 432
13.4 Polymeric Thin Films 437
CHAPTER 14. PREPARATION AND PROPERTIES OF CONDUCTIVE THIN FILMS 439
14.1 Introduction 439
14.2 Metals and Metal Alloys 439
14.3 Resistor Materials 447
14.4 Transparent Conducting Films 448
14.5 Miscellaneous Materials 450
CHAPTER 15. PREPARATION AND PROPERTIES OF SUPERCONDUCTING AND MAGNETIC THIN FILMS 457
15.1 Introduction 457
15.2 Superconducting Materials 457
15.3 Magnetic Materials 461
Part IV: APPLICATIONS 464
CHAPTER 16. USES OF CVD THIN FILMS 466
16.1 Introduction 466
16.2 Applications in Electronics and Microelectronics 467
16.3 Applications in the Field of Microwaves and Optoelectronics 497
16.4 Miscellaneous Applications 508
16.5 Artificial Heterostructures (Quantum Wells, Superlattices, Monolayers, Two-Dimensional Electron Gasses) 513
Part V: CONCLUSIONS 518
CHAPTER 17. PRESENT AND FUTURE IMPORTANCE OF CVD FILMS 520
17.1 Present Status and Future Trends in CVD Films 520
17.2 Concluding Remarks 523
REFERENCES 526
INDEX OF ACRONYMS AND ABBREVIATIONS 683
AUTHOR INDEX 685
CVD FILM INDEX 705
SUBJECT INDEX 710
SUPPLIER INDEX 718

Produkt-Details

• Erscheint lt. Verlag: 22.6.2016
• Sprache: englisch
• Themenwelt: Naturwissenschaften ► Chemie ► Technische Chemie
• Themenwelt: Naturwissenschaften ► Physik / Astronomie
• Themenwelt: Technik ► Maschinenbau
• ISBN-10: 1-4832-9173-1 / 1483291731
• ISBN-13: 978-1-4832-9173-4 / 9781483291734