Nano-CMOS Circuit and Physical Design
Seiten
2008
John Wiley & Sons Inc (Hersteller)
978-0-471-67887-8 (ISBN)
John Wiley & Sons Inc (Hersteller)
978-0-471-67887-8 (ISBN)
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Aims to bridge the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM and the physical implementation.
Based on the authors' expansive collection of notes taken over the years, "Nano-CMOS Circuit and Physical Design" bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
Based on the authors' expansive collection of notes taken over the years, "Nano-CMOS Circuit and Physical Design" bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
| Erscheint lt. Verlag | 31.1.2008 |
|---|---|
| Verlagsort | New York |
| Sprache | englisch |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 0-471-67887-2 / 0471678872 |
| ISBN-13 | 978-0-471-67887-8 / 9780471678878 |
| Zustand | Neuware |
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