CCD Image Sensors in Deep-Ultraviolet
Springer Berlin (Verlag)
978-3-540-22680-2 (ISBN)
As the deep-ultraviolet (DUV) laser technology continues to mature, an increasing number of industrial and manufacturing applications are emerging. For example, the new generation of semiconductor inspection systems is being pushed to image at increasingly shorter DUV wavelengths to facilitate inspection of deep sub-micron features in integrated circuits. DUV-sensitive charge-coupled device (CCD) cameras are in demand for these applications. Although CCD cameras that are responsive at DUV wavelengths are now available, their long-term stability is still a major concern. This book describes the degradation mechanisms and long-term performance of CCDs in the DUV, along with new results of device performance at these wavelengths.
Flora Li received her Bachelor of Applied Science degree in Electrical Engineering from University of Waterloo, Canada, in 2002. She completed her MASc degree in Electrical Engineering at University of Waterloo in 2003, where her research focus was on the investigation of deep-UV sensitive CCD image sensors and the related radiation damage issues. She is currently pursuing her Ph.D. degree in the field of organic electronics and polymer TFTs, under the supervision of Prof. Arokia Nathan at the University of Waterloo.
Overview of CCD.- CCD Imaging in the Ultraviolet (UV) Regime.- Silicon.- Silicon Dioxide.- Si-SiO2 Interface.- General Effects of Radiation.- Effects of Radiation on CCDs.- UV-Induced Effects in Si.- UV Laser Induced Effects in SiO2.- UV Laser Induced Effects at the Si-SiO2 Interface.- CCD Measurements at 157nm.- Design Optimizations for Future Research.- Concluding Remarks.
| Erscheint lt. Verlag | 1.3.2005 |
|---|---|
| Reihe/Serie | Microtechnology and MEMS |
| Zusatzinfo | XII, 232 p. 84 illus. |
| Verlagsort | Berlin |
| Sprache | englisch |
| Maße | 155 x 235 mm |
| Gewicht | 525 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| Technik ► Maschinenbau | |
| Schlagworte | Bildsensor • CCD image sensor • Deep-UV damage mechanisms • Design • Eximer laser • Imaging • Integrated circuit • Laser • Optimization • photodiode • semiconductor • Sensor • Technology • UV photodiodes • UV-Strahlung |
| ISBN-10 | 3-540-22680-X / 354022680X |
| ISBN-13 | 978-3-540-22680-2 / 9783540226802 |
| Zustand | Neuware |
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