Resolution Enhancement Techniques in Optical Lithography v. TT47
Seiten
2001
SPIE Press (Verlag)
978-0-8194-3995-6 (ISBN)
SPIE Press (Verlag)
978-0-8194-3995-6 (ISBN)
The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. This work summarizes the latest enhancement research that has matured since the 1980s.
The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.
The acceleration of integrated circuit miniaturization is challenging lithographers to push the limits of optical lithography by ever more precise engineering and innovations. As IC device dimensions grow smaller, circuits outpace the introduction of shorter exposure wavelengths and higher numerical aperture lenses, increasing the importance of resolution enhancement techniques. This work summarizes the latest enhancement research that has matured since the 1980s. Theoretical and practical aspects of commonly used techniques are discussed, serving students and practising lithographers alike. #Conoptical Imaging And Resolution; Modified Illumination; Optical Proximity Correction; Alternating Phase-Shifting Mask; Attenuated Phase-Shifting Mask; Selecting Appropriate Rets; Second Generation Rets; Concluding Remarks.
Introduction. Optical imaging and resolution. Modified illumination. Optical proximity correction. Alternating phase-shifting mask. Attenuated phase-shifting mask. Selecting appropriate RETs. Second generation RETs. Concluding remarks.
| Erscheint lt. Verlag | 31.3.2001 |
|---|---|
| Reihe/Serie | Tutorial Texts |
| Zusatzinfo | Illustrations |
| Verlagsort | Bellingham |
| Sprache | englisch |
| Gewicht | 505 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Optik |
| Technik ► Elektrotechnik / Energietechnik | |
| ISBN-10 | 0-8194-3995-9 / 0819439959 |
| ISBN-13 | 978-0-8194-3995-6 / 9780819439956 |
| Zustand | Neuware |
| Haben Sie eine Frage zum Produkt? |
Mehr entdecken
aus dem Bereich
aus dem Bereich
Grundlagen - Verfahren - Anwendungen - Beispiele
Buch | Hardcover (2022)
Hanser, Carl (Verlag)
CHF 69,95
Grundlagen und Anwendungen
Buch | Hardcover (2023)
Hanser, Carl (Verlag)
CHF 83,95
