Plasma Nanoscience
Seiten
2009
Wiley-VCH Verlag GmbH (Hersteller)
978-3-527-62332-7 (ISBN)
Wiley-VCH Verlag GmbH (Hersteller)
978-3-527-62332-7 (ISBN)
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Filling the need for a single work specifically addressing how to use plasma for the fabrication of nanoscale structures, this book is the first to cover plasma deposition in sufficient depth.
The author has worked with numerous R&D institutions around the world, and here he begins with an introductory overview of plasma processing at micro- and nanoscales, as well as the current problems and challenges, before going on to address surface preparation, generation and diagnostics, transport and the manipulation of nano units.
The author has worked with numerous R&D institutions around the world, and here he begins with an introductory overview of plasma processing at micro- and nanoscales, as well as the current problems and challenges, before going on to address surface preparation, generation and diagnostics, transport and the manipulation of nano units.
Dr. Ken Ostrikov is Australian Queen Elizabeth II Fellow at University of Sydney, Australia. He has been with numerous R&D institutions in Germany, Japan, Singapore, and Australia. His research topics include chemically active plasmas for nanofabrication, synthesis of functional materials and bio-compatible coatings, development of industrial process specifications and integrated plasma facilities for materials synthesis and surface modification, as well as several fundamental topics. Dr. Ostrikov's contribution to the field was honored by several awards and fellowships and published in more than 200 papers in peer-reviewed international journals and conference proceedings.
| Verlagsort | Weinheim |
|---|---|
| Sprache | englisch |
| Maße | 170 x 240 mm |
| Gewicht | 1223 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 3-527-62332-9 / 3527623329 |
| ISBN-13 | 978-3-527-62332-7 / 9783527623327 |
| Zustand | Neuware |
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