Nanoscale Calibration Standards and Methods – Dimensional and Related Measurements in the Micro– and Nanometer Range
Wiley-VCH Verlag GmbH (Hersteller)
978-3-527-60666-5 (ISBN)
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The quantitative determination of the properties of micro and nanostructures is essential in research and development. It is also a prerequisite in process control and quality assurance in industry. The knowledge of the geometrical dimensions of structures in most cases is the base, to which other physical and chemical properties are linked. Quantitative measurements require reliable and stable instruments, suitable measurement procedures as well as appropriate calibration artefacts and methods. The seminar "NanoScale 2004" (6th Seminar on Quantitative Microscopy and 2nd Seminar on Nanoscale Calibration Standards and Methods) at the National Metrology Institute (Physikalisch Technische Bundesanstalt PTB), Braunschweig, Germany, continues the series of seminars on Quantitative Microscopy. The series stimulates the exchange of information between manufacturers of relevant hard and software and the users in science and industry.
The topics addressed in these proceedings are: the application of quantitative measurements and measurement problems in: microelectronics, microsystems technology, nano/quantum/molecular electronics, chemistry, biology, medicine, environmental technology, materials science, surface processing; calibration & correction methods: calibration methods, calibration standards, calibration procedures, traceable measurements, standardization, uncertainty of measurements; and, instrumentation and methods: novel/improved instruments and methods, reproducible probe/sample positioning, position measuring systems, novel/improved probe/detector systems, linearization methods, and image processing.
Gunter Wilkening received his Ph.D. in Solid State Physics from the Technical University of Braunschweig, Germany, in 1977. In 1978, he joined the National Metrology Institute (Physikalisch Technische Bundesanstalt PTB), where he conducts research in the fields of force measurement and dimensional measurements in the micro and nanometre range. Since 1988 he has been involved in Scanning Probe Microscopy and its use for quantitative measurements. In 1994, Professor Wilkening became head of the Nano and Micrometrology Department. He is an active member of a number of national and international committees. Ludger Koenders is head of the Film Thickness and Nanostructures Research Group at the National Metrology Institute (Technische Bundesanstalt PTB) in Braunschweig, Germany. He received his Diploma and his Ph.D. in Physics from the University of Duisburg. For his Ph.D. thesis he investigated the adsorption of hydrogen and oxygen on III V semiconductor surfaces using surface analytical techniques (AES, EELS, UPS, XPS) and resonant Raman spectroscopy. He joined the National Metrology Institute in 1989 and has worked on investigations of tip sample effects in STM, on the development metrological SPM and of transfer standards for SPM. He has co ordinated several international comparisons in the field of step height and surface roughness measurements.
PART I: INSTRUMENTATION OVERVIEW. 1. Metrological Scanning Probe Microscopes Instruments for Dimensional Nanometrology (Hans Ulrich Danzebrink, Frank Pohlenz, Gaoliang Dai, and Claudio Dal Savio). 2. Nanometrology at the IMGC (M. Bisi, E. Massa, A. Pasquini, G. B. Picotto, and M. Pisani). 3. Metrological Applications of X ray Interferometry (Andrew Yacoot). PART II: INSTRUMENTATION LONG RANGE SCANNING PROBE MICROSCOPE. 4. Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine (Eberhard Manske, Rostislav Mastylo, Tino Hausotte, Norbert Hofmann, and Gerd Jager). 5. Coordinate Measurements in Microsystems by Using AFM Probing: Problems and Solutions. 6. Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures (Gaoliang Dai, Frank Pohlenz, Hans Ulrich Danzebrink, Min Xu, Klaus Hasche, Gunter Wilkening). PART III: INSTRUMENTATION DEVELOPMENT OF SPM and SENSORS. 7. Traceable Probing with an AFM (K. Dirscherl and K. R. Koops). 8. Scanning Probe Microscope Setup with Interferometric Drift Compensation (Andrzej Sikora, Dmitri V. Sokolov, and Hand U. Danzebrink). 9. DSP Based Metrological Scanning Force Microscope with Direct Interfermetric Position Measurement and Improved Measurement Speed (Gaoliang Dai, Frank Pohlenz, Hans Ulrich Danzebrink, Klaus Hasche, and Gunter Wilkening). 10. Combined Confocal and Scanning Probe Sensor for Nano Coordinate Metrology (Dmitri V. Sokolov, Dmitri V. Kazantesev, James W. G. Tyrrell, Tamosz Hasek, and Hans U. Danzebrink). 11. Combined Shear Force Tunneling Microscope with Interferometric Tip Oscillation Detection for Local Surface Investigation and Oxidation (Andrzej Sikora, Teodor Gotszalk, and Roman Szeloch). 12. Low Noise Piezoresistive Micro Force Sensor (L. Doering, E. Peiner, V. Nesterov, and U. Brand). PART IV: CALIBRATION OVERVIEW. 13. Towards a Guideline for SPM Calibration (T. Dziomba, L. Koenders, and G. Wilkening). 14. True Three Dimensional Calibration of Closed Loop Scanning Probe Microscopes (J. Garnaes, A. Kuhle, L. Nielsen, and F. Borsetto). 15. Height and Pitch at Nanoscale How Traceable is Nanometrology? (L. Koenders and F. Meli). 16. The Behavior of Piezoelectric Actuators and the Effect on Step Height Measurement with Scanning Force Microscopes (A. Grant, L. McDonnell, and E. M. Gil Romero). 17. An Approach to the Development of Tolerance Systems for Micro and Nanotechnology (J. Schobel and E. Westkamper). PART V: CALIBRATION STANDARDS FOR NANOMETROLOGY. 18. Standards for the Calibration of Instruments for Dimensional Nanometrology (L. Koenders, T. Dziomba, P. Thomsen Schmidt, and G. Wilkening). 19. "Atomic Flat" Silicon Surface for the Calibration of Stylus Instruments (S. Groger and M. Dietzsch). 20. Investigations of Nanoroughness Standards by Scanning Force Microscopes and Interference Microscope (R. Kruger, Sehm, T. Dziomba, and G. Dai). 21. Testing the Lateral Resolution in the Nanometre Range with a New Type of Certified Reference Material (M. Senoner, Th. Wirth, W. Osterle, I. Kaiander, R. L. Sellin, and D. Bimberg). PART VI: CALIBRATION TIP SHAPE. 22. Reconstruction and Geometric Assessment of AFM Tips (Torsten Machleidt, Ralf Kastner, and Karl Heinz Franke). 23. Comparison of Different Methods of SFM Tip Shape Determination for Various Characterisation Structures and Types of Tip (S. Czerkas, T. Dziomba, and H. Bosse). PART VII: CALIBRATION OPTICAL METHODS. 24. Double Tilt Imaging Method for Measuring Aperture Correction Factor (Yen Liang Chen, Chao Jung Chen, and Gwo Sheng Peng). 25. How Statistical Noise Limits the Accuracy of Optical Interferometry for Nanometrology. 26. Uncertainty Analysis of the PTB Measuring Equipment for the Investigation of Laser Interferometers (G. Sparrer and A. Abou Zeid). PART VIII: APPLICATION LATERAL STRUCTURES. 27. Lateral and Vertical Diameter Measurements on Polymer Particles with a Metrology AFM (F. Meli). 28. Pitch and CD Measurements at Anisotropically Etched Si Structures in an SEM (C. G. Grase, S. Czerkas, H. Bosse, Yu. A Novikov, and A. V. Rakov). 29. Analysis and Comparison of CD SEM Edge Operators: A Contribution to Feature Width Metrology. 30. Measurement of High Resolution Interferential Encoders Using the PTB Nanometer Comparator (J. Flugge, R. Koening, and H. Bosse). PART IX: APPLICATION SURFACE. 31. Experimental Characterization of Micromilled Surfaces by Large Range AFM (P. Bariani, G. Bissacco, H. N. Hansen, and L. De Chiffre). 32. Investigation of the Surface Roughness Measurement of Mass Standards (C. Zerrouki, L. R. Pendrill J. M. Bennett, Y. Haidar, F. De Fornel, and P. Pinot). 33. Surface Analysis of Precision Weights for the Study of Commonly Occurring Contaminants (Ulf Jacobsson and Peter Sjovall). 34. Tip Shape Effect on the Accuracy of Capacitance Determination by Scanning Capacitance Microscopes (Stefan Lanyi). 35. Atomic Force Microscope Tip Influence on the Fractal and Multi Fractal Analyses of the Properties of Randomly Rough Surfaces (P. Klapetek I. Ohlidal, and Bilek). PART X: APPLICATION MATERIAL PROPERTIES. 36. Atomic Force Microscope Indentation Measurement Software (David Shuman). 37. Nanodeformation Analysis Near Small Cracks by Means of NanoDAC Technique (J. Keller, D. Vogel, B. Michel). 38. PTB s Precision Interferometer for High Accuracy Characterization of Thermal Expansion Properties of Low Expansion Materials (R. Schodel and A. Abou Zeid). Index.
| Erscheint lt. Verlag | 31.3.2006 |
|---|---|
| Verlagsort | Weinheim |
| Sprache | englisch |
| Gewicht | 10 g |
| Themenwelt | Naturwissenschaften ► Chemie |
| Technik ► Elektrotechnik / Energietechnik | |
| Technik ► Maschinenbau | |
| ISBN-10 | 3-527-60666-1 / 3527606661 |
| ISBN-13 | 978-3-527-60666-5 / 9783527606665 |
| Zustand | Neuware |
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